Kurt Fredrickson is a litigation associate in O’Melveny’s San Francisco office. His practice focuses on intellectual property litigation and counseling for both solo inventors and multinational corporations. Kurt has extensive experience within the technology sector relating to internet advertising, semiconductor manufacturing, construction equipment, medical devices, wearable electronics, and graphics applications.
Kurt advises clients throughout litigation’s entire life cycle, including pre-suit investigations, pleadings, discovery, infringement and invalidity contentions, claim construction, dispositive motions, and trial, having represented clients in District Court, the Patent Trial and Appeal Board, and the United States International Trade Commission.
With a Ph.D. in Physics and experience working as Computational Chemist, Kurt leverages an in-depth understanding of his clients’ technologies to best serve their interests. Kurt also has a deep understanding of the patent prosecution system as a former patent agent and an inventor on four patents.
- Represented a multinational electronics corporation as a plaintiff in trial in the District of Delaware, resulting in a jury verdict of infringement of two patents and willful infringement.*
- Represented a plaintiff pro bono client and led pretrial motions, nightly disclosures, and cross-examination of a key witness at trial in the Northern District of California, resulting in a jury verdict of liability under both the Unruh Act and negligence.*
* Work completed prior to joining O’Melveny
Admissions
Bar Admissions
- California
Education
- University of California, Berkeley, J.D.: Order of the Coif; Articles Editor, Berkeley Technology and Law Journal
- The University of Texas at Austin, Ph.D., Condensed Matter and Material Physics
- University of California, Davis, B.S., Physics
Honors & Awards
- Order of the Coif, University of California, Berkeley School of Law
- IP & Technology Law Certificate, University of California, Berkeley Law
- Aldo J. Test Award for Best Paper Submission, Berkeley Technology Law Journal
- George Hutchinson Writing Award, Federal Circuit Bar Association
- Professional Development Award, the University of Texas at Austin Graduate School
- Ovshinksy Travel Award, American Physical Society
- Dean’s List, University of California, Davis School of Letters and Sciences
- Member of Sigma Pi Sigma, Physics Honors Society
Professional Activities
Judicial Externship
- The Honorable Janis Lynn Sammartino, U.S. District Court, Southern District of California
Publications
- Kurt Fredrickson, Note, “Otherwise Available to the Public”: Using § 102 to Avoid the Supreme Court’s Patent-Eligibility Quagmire, 33 Fed. Cir. Bar J. 271 (2025).
- Inventor: Methods & Precursors for Selective Deposition of Metal Films, U.S. Patent Nos. 11,515,151; 11,887,847; Korean Patent No. 102,394,352; Japanese Patent No. 6,968,993.
- Inventor: Methods of Selective Atomic Layer Deposition, U.S. Patent Nos. 11,821,085; 11,887,847; 12,291,779; Taiwanese Patent No. 879,732; Korean Patent No. 102,515,131; Japanese Patent Nos. 7,019,837; 7,290,760.
- Alexander A. Demkov et al., First-Principles Modeling of Interface Effects in Oxides, in Handbook of Material Modeling 1 (Wanda Andreoni and Sidney Yip eds., 2018).
- Zhi Whi Seh et al., Two-Dimensional Molybdenum Carbide as an Efficient Electrocatalyst for Hydrogen Evolution, 1 ACS Energy Letters 589 (2016).
- Kurt D. Fredrickson et al., Mechanism of Oxidation Protection of the Si(001) Surface by Sub-Monolayer Sr Template, 120 J. Applied Physics 065301 (2016).
- Kurt D. Fredrickson et al., Theoretical Modeling and Experimental Observations of the Atomic Layer Deposition of SrO Using a Cyclopentadienyl Sr Precursor, 145 J. Chem. Physics 145 (2016).
- Kurt D. Fredrickson, First Principles Studies of Perovskite Thin Films and Heterostructures (Aug. 2015) (Ph.D. Thesis, University of Texas at Austin).
- Patrick Ponath et al., Carrier Density Modulation in a Germanium Heterostructure by Ferroelectric Switching, 6 Nature Commc'ns 6067 (2015).
- Alexander A. Demkov et al., Integrated Films of Transition Metal Oxides for Information Technology, 147 Microelectronic Eng'g 285 (2015).